气体放电伏安特性对TiN薄膜结构和性能的影响

Influence of Volt-Ampere Characteristics of Gas Discharge on Structure and Properties of TiN Films

针对溅射离子镀离化率低及多弧离子镀易产生微米级熔滴喷溅这一长期制约离子镀技术发展的难题,依据金属靶材内部电子在通过电阻值较大的组织缺陷处会导致该区域温度上升的焦耳热效应和金属表面高温下电子热发射等物理学现象,建立以离子碰撞和靶材热发射为脱靶机制的新型微弧离子镀技术。通过氩离子的轰击动能和金属靶材内电流的焦耳热效应共同促使靶面缺陷处温度迅速上升,增加了该区域内电子和原子的动能使其能够克服表面势垒从靶材表面大量逸出。等离子区内靶材原子和电子数量的增加提高了镀料粒子的碰撞离化率,且靶面未出现明显电弧避免了靶材表面的熔融喷溅,从而获得高离化率和高密度的镀料粒子。实验结果表明:微弧离子镀技术制备的TiN薄膜具有致密的结构、良好的表面质量、较高的显微硬度、较强的膜基结合力和良好的抗腐蚀性能。

The low ionization rate of magnetron sputtering ion plating and the micron-size droplet splash of multi-arc ion plating restrict the development of ion plating technique for a long time. According to the Joule heating effect that the electrons going through a defect area with a relatively higher resistance value increase the temperature of the defect area, and the thermionic emission from the metal surface with a high temperature, a new type of micro-arc ion plating technology based on the target material escaping from the target by the ion collisions and thermal emission was established in the present paper. The temperature of target surface rose rapidly by the bombardment of Ar＋ and Joule heating effect, and the kinetic energy of the target electrons and atoms increased to overcome surface work function to escape from the target surface. The increasing of atoms and electrons in the plasma improved the collision ionization rate of the target atoms, and obvious arc did not appear on the target surface which avoided the melt splashing of target material; therefore the target atoms of the micro-arc ion plating could obtain a high ionization rate and a high density. The results show that the TiN film deposited by micro-arc ion plating has dense microstructure, fine surface quality, high hardness, well film adhesion and strong corrosion resistance.