GH586等离子喷涂CoCrAlYTaSi涂层的高温氧化性能研究

Study on High Temperature Oxidation Performance of CoCrAlYTaSi Coating on GH586 Prepared by Plasma Spraying

采用等离子喷涂技术在GH586基体上制备了CoCrAlYTaSi涂层,用扫描电镜研究了该涂层的微观结构。并在1100℃下研究了该涂层的高温氧化性。结果表明:在涂层表面,Al元素优先在某些区域氧化成α-Al_2O_3并向水平和垂直方向生长成岛状。随后Cr元素富集并开始氧化,最终在表面生成一层致密的氧化膜。在涂层中部,Al元素在涂层优先氧化,形成黑色条带状物质,然后进入均匀氧化阶段。在涂层结合面上生成了一层以Al_2O_3和TiO_2为主的TGO层。

CoCrAlYTaSi coating was fabricated on GH586 matrix by plasma spraying technology, and the microstructure of the coating was studied by SEM. The high temperature oxidation resistance of the coating at 1100 ℃ was studied. The results show that on the surface of the coating, the A1 element is preferentially oxidized to α-Al2O3 in some areas and grows to the shape of island in the horizontal and vertical directions. Then, Cr elements are enriched and oxidized, and a dense oxide film is formed on the surface. In the middle of the coating, AI element is preferentially oxidized in the coating, a black strip material appears, and then enters the homogeneous oxidation stage. TGO layer mainly with Al2O3 and TiO2 is generated on the interface of the coating.