期刊文献+

互补式金氧半(CMOS)集成电路的静电放电防护方法研究 被引量:2

Research on electrostatic discharge protection method for complementary metal oxide semiconductor (CMOS) integrated circuit
下载PDF
导出
摘要 在纳米CMOS集成电路中,静电放电(ESD,electrostatic discharge)防护能力随着组件的尺寸缩减而大幅地降低,传统的ESD防护电路设计及方法已不堪使用,所以在纳米制程中ESD防护组件的防护电路设计必需更加以改良。本文针对一个具有初始导通特性的片上(纯净)(already-on(native))NMOS(N-Metal-Oxide-Semiconductor,N沟道金属氧化物半导体)组件,研究其ESD组件特性,提出了其在纳米CMOS集成电路上的创新应用,提出already-on(native)组件的全芯片ESD防护电路架构,设计了全新的ESD防护电路。 In nano CMOS integrated circuit, the protection ability of ESD ( discharge electrostatic) has oeen great- ly reduced with the size of the components. The traditional ESD protection circuit design and method can not be used, so the protection circuit design of the nano scale ESD protection circuit design must be improved. In this paper, the characteristics of an ESD (native) NMOS (N) ESD (N-Metal-Oxide-Semiconductor) (already-on) (CMOS) are proposed. The new ESD protection circuit for already-on (native) is proposed.
作者 夏继军
出处 《激光杂志》 北大核心 2017年第6期140-143,共4页 Laser Journal
基金 2015湖北省软科学课题项目(2015SK0201)
关键词 CMOS集成电路 ESD防护 Already-on(native)NMOS组件 CMOS integrated circuit ESD protection Already-on (native) NMOS component
  • 相关文献

参考文献4

二级参考文献92

  • 1程剑平,朱卓娅,魏同立.单节锂离子电池保护芯片的设计[J].电路与系统学报,2004,9(4):66-70. 被引量:13
  • 2郑浩,叶星宁.一种低压CMOS带隙电压基准源[J].微电子学,2005,35(5):542-544. 被引量:6
  • 3郑朝霞,邹雪城,童乔凌.电池保护芯片中低功耗技术的研究与实现[J].微电子学与计算机,2006,23(4):174-176. 被引量:4
  • 4GREEN T, DENSON W. A review of EOS/ESD field failures in military equipmen [ C ] //Proc of the 10^th EOS/ESO Symp. Anaheim, USA, 1988:7-14.
  • 5EUZENT B L, MALONEY T J, DONNER J C. Reducing field failure rate within proven EOS/ESO design [ C ]//Proc of the 13^th EOS/ESO Symp. Los Vegas, USA, 1991 : 59-64.
  • 6COOK C, DANIEL S. Characterization and failure analysis of advanced CMOS submicron ESD protection structures [ C ]// Proc of the 14^th EOS/ESO Symp. Dallas, USA, 1992 : 149-157.
  • 7HOWER P, LIN J, HAYNIE S, et al. Safe operating area considerations in LDMOS transistors [ C ] // Proc of the 11^th ISPSD Symp. Toronto, Canada, 1999 : 55-58.
  • 8SZE S M, KWORK K N. Physics of semiconductor devices [ M ] . 3rd Ed. New York : John Wiley and Sons, 2006.
  • 9MALONEY T J, KHURANA N. Transmission line pulsing techniques for circuit modeling of ESD phenomena[ C ]//Proc of the 7^th EOS/ESO Symp. Minneapolis, USA, 1985:49-54.
  • 10MERGENS M, WILKENING W, METTLER S, et al. Analysis and compact modeling of lateral DMOS power devices under ESD stress conditions[ C ]//Proc of the 21^th EOS/ESO Symp. Orlando, USA, 1999 : 1-10.

共引文献37

同被引文献5

引证文献2

二级引证文献4

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部