非平衡磁控溅射沉积Ti-N薄膜色彩和性能调控研究

Colors and Properties Regulation of Ti-N Film Deposited by Unbalanced Magnetron Sputtering

目的研究Ti-N薄膜颜色和硬度及其结合强度的影响因素。方法利用封闭磁场非平衡磁控溅射离子镀膜技术,该变溅射偏压、氮气流量等参数,分别在304不锈钢基体和载玻片基体上沉积多彩Ti-N薄膜。用努氏硬度、划痕法和球坑法分别评价Ti-N薄膜的显微硬度和结合强度等性能。结果当偏压和溅射电流分别为-60 V和2 A时,将反应气体氮气流量从3sccm逐渐增加到20sccm,Ti-N薄膜颜色依次发生从"淡黄-金黄-红黄-紫红-金黄"的循环变化趋势。薄膜的硬度随氮气流量的增加在601~700HK之间呈逐步上升的趋势。膜基结合普遍较好。当氮气流量和溅射电流分别为10sccm和2 A时,将负偏压从-50 V逐渐增加到-120 V,薄膜颜色从淡黄色变成金黄色,膜基结合强度较好。硬度随偏压的增加变化不明显。结论影响Ti-N薄膜颜色的主要因素为氮气流量,偏压也可以轻微地改变薄膜颜色,但对薄膜性能影响并不明显。

The work aims to study influencing factors of Ti-N film color, hardness and bonding strength. Multicolored Ti-N films were deposited by closed field unbalanced magnetron sputtering ion plating on 304 SUS plates and glass slides, respec- tively, by adjusting parameters including sputtering bias-voltage and N2 flow rate. Properties including microhardness and bonding strength of the films were evaluated by Knoop hardness, scarification and ball crater method, respectively. Color of the Ti-N films deposited at a bias of 60 V and sputtering current of 2 A changed from ＂faint yellow-golden-reddish yel- low-fuchsia-golden＂ as N2 flow rate increased from 3sccm to 20sccm. Hardness of the films increased from 601HK to700HK as the flow rate of reactive gas of N2 increased. All films exhibited good bonding strength on different substrates. Provided with N2 flow rate of 10seem and sputtering current of 2 A, and as negative bias increased 50 V to 120 V, color of the Ti-N films changed from light yellow to golden, favorable bonding strength was obtained, and no obvious change in film hardness was detected as the bias increased. Hence the film color is mainly affected by N2 flow rate and slightly affected by bias while film properties is not affected by bias significantly .