退火温度对柔性石墨烯薄膜力学性能的影响（英文）

Effect of annealing temperature on the mechanical properties of flexible graphene films

通过抽滤法制备出氧化石墨烯薄膜,然后分别将其在1 300、1 400、1 500、1 600、1 700℃下进行炭化得到石墨烯薄膜。石墨烯薄膜的微观结构使用扫描电子显微镜、原子力显微镜、拉曼、X射线衍射光谱等仪器进行表征,其拉伸强度和断裂伸长率也随着退火温度发生了变化。当石墨烯薄膜在1 500℃进行退火时,其拉伸强度和断裂伸长率分别达到了最大值,为22.41 M Pa和2.44%,这可能是由于1 500℃时,石墨烯表面产生了更多的物理锁合位点。关于石墨烯薄膜退火温度-结构-机械性能之间的关系的研究,有望为石墨烯薄膜在实际应用中性能的优化提供理论指导。

Free-standing graphene films （GFs） as functional materials require high mechanical performance for a convenient in-dustrial processing. GFs were prepared from graphene oxide films by annealing temperatures from 1 300 to 1 700 益, and were char-acterized by AFM, XRD,SEM,Raman spectroscopy and mechanical testing. Results indicate that the samples have a maximum tensile strength and fracture strain of 22.41 MPa and 2.44%,respectively and a minimum thermal conductivity of 744 Wm-1·K-1 for an annealing temperature at 1 500 益.This is related to physical interlocking which results,from surface wrinkles of the gra-phene layers.