电沉积制备镍-铁薄膜及其性能的研究

Investigation on Electrodeposition Preparation and Properties of Ni-Fe Films

研究了电流密度对镍-铁薄膜的电化学过程、成分、表面形貌、耐蚀性和磁性能的影响。通过实验发现,镍-铁薄膜的电沉积属于一种"异常共沉积"现象。低电流密度下,镍-铁薄膜中铁的质量分数较高;高电流密度下,镍-铁薄膜中镍的质量分数较高。镍-铁薄膜属于一种典型的颗粒膜层,在4A/dm2下制得的镍-铁薄膜表面致密、颗粒细致、耐蚀性较好。随着电流密度的增大,镍-铁薄膜的矫顽力逐渐升高,而比饱和磁化强度逐渐降低。

Effect of current density on the electrochemistry process, components, surface morphology, corrosion resistance and magnetic property of Ni-Fe films was investigated. Through the experiment, it was found that, electrodeposition of Ni-Fe film belonged to a kind of anomalous co-deposition phenomenon. At low current density, the mass fraction of iron in Ni-Fe film was higher. However, at high current density, the mass fraction of nickel in Ni-Fe film was higher. The Ni-Fe film prepared at 4 A/dm2 exhibit typical nodular structure, which possess dense surface and refined grain, resulting in better corrosion resistance. With the increasing of current density, the coercivity of Ni-Fe film was increased, while the saturation magnetization was decreased.