磁控溅射TiAlSiN膜的抗氧化性能

Oxidation Resistance Properties of TiAlSiN Coatings Deposited by Magnetron Sputtering

目前,针对TiAlN和TiAlSiN薄膜在800~1 000℃高温氧化时的硬度及抗氧化性能研究较少。利用磁控溅射技术,在高速钢W18Cr4V表面制备了TiAlN和TiAlSiN薄膜,当Al靶功率为100 W、Si靶溅射电流为0.20 A时,TiAlSiN薄膜硬度及弹性模量达到最大值,对此条件下的膜层进行了大气高温氧化试验。采用激光共聚焦显微镜、扫描电子显微镜(SEM)和能谱仪(EDS)、X射线衍射仪(XRD)等检测手段,研究了800,900,1 000℃下2种薄膜的抗氧化性。结果表明:经相同温度氧化处理后,TiAlSiN薄膜的表面粗糙度明显小于TiAlN薄膜的;在TiAlN中引入Si元素形成Si3N4包裹TiN纳米晶的复合结构,抑制了膜层中裂纹的形成,使TiAlSiN薄膜在相同氧化温度下的抗氧化性能比TiAlN薄膜更加优异。

TiAlN and TiAISiN coatings were prepared on high-speed steel （W18Cr4V） substrate by magnetron sputtering. While the Al target power was 100 W and the Si target sputtering current was 0.2 A, the hardness and elastic modulus of TiAISiN coating were up to the maximum. Under this condition, the atmospheric hightemperature oxidation experiment of the coatings was carried out and the oxidation resistance of TiAIN and TiAlSiN coatings was studied at 800 ℃, 900 ℃ and 1 000℃ with laser scanning confocal microscope, SEM, EDS, XRD and ottler testing means. Results showed that the surface roughness of TiAlSiN coating was lower than that of TiAlN coating after the oxidation treatment at the same temperature. Adding Si element into TiAlN, it formed the composite structure with TiN nano-crystalline surrounded by Si3N4, which suppressed the formation of cracks in the coatings and made the oxidation resistance of TiAlSiN coating better than that of TiAlN coating at the same oxidizing temperature.