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能量过滤磁控溅射制备TiO_2薄膜的光催化性能研究 被引量:2

Photocatalytic Properties of TiO_2 Thin Films Deposited by Energy Filtering Magnetron Sputtering
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摘要 利用能量过滤磁控溅射(EFMS)技术制备了TiO_2薄膜,并利用X射线衍射、扫描电镜和紫外-可见分光光度计分析了薄膜的结构、形貌和对RhB溶液的光催化效率。研究表明:与直流磁控溅射技术相比,EFMS技术制备的TiO_2薄膜的晶粒尺寸更小,表面更加平整,紫外光照射2 h后,其光催化效率提高了1.5倍。 The TiO_2 thin films were deposited by DC and energy filtering magnetron sputtering( EFMS) on glass substrate,respectively. The impact of the mesh-size of the energy filtering grid on the microstructures and photocatalytic properties of the TiO_2 films was investigated with X-ray diffraction,scanning electron microscopy and UV-spectroscopy. The results show that depending on the mesh-size,the energy filtering significantly improved the quality of DC magnetron sputtered( DMS) TiO_2 coatings. The energy filtering markedly reduced the grain-size,decreased the surface roughness,improved the uniformity and increased the photocatalytic efficiency of the DC magnetron sputtered TiO_2 coatings,because energy filtering effectively prevents the high energy secondary electrons from damaging the substrate and film growth. After UV irradiation for 2 h in degrading rhodamine-B( Rh B)solution,the TiO_2 coatings,grown by EFMS,displayed the photocatalytic efficiency 1. 5 times higher than that synthesized by DMS.
出处 《真空科学与技术学报》 CSCD 北大核心 2017年第7期685-688,共4页 Chinese Journal of Vacuum Science and Technology
基金 河南省重点科技攻关计划项目(No.152102210038)
关键词 能量过滤磁控溅射 直流磁控溅射 光催化 TIO2薄膜 EFMS DMS Photo-catalysis TiO2 films
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