能量过滤磁控溅射技术制备TiO_2薄膜光学性能的均一性研究

Uniformity of Microstructures and Optical Properties of TiO_2 Coatings Synthesized by Energy Filtering Magnetron Sputtering

采用直流磁控溅射(DMS)和能量过滤磁控溅射(EFMS)技术在玻璃衬底上制备TiO_2薄膜。利用扫描电子显微镜、X射线衍射、椭圆偏振光谱仪等对薄膜的性能进行表征和分析。结果表明EFMS技术制备的TiO_2薄膜在较大面积上结晶性能以及光学性能的均一性均得到改善。

The uniformity of microstructures and optical properties of the TiO_2 thinfilms,deposited by DC magnetron sputtering（ DMS） and by energy filtering magnetron sputtering（ EFMS） on glass substrates,was characterized with X-ray diffraction,scanning electron microscopy and ellipsometric spectroscopy. The results show that when it comes to the uniformity of the TiO_2 coatings,EFMS outperforms the conventional DMS,particularly in large-area film growth. For example,the advantages of the EFMS TiO_2 coating over the DMS films include the higher uniformity,better crystallinity,smaller grain-size,smoother surface,bigger transmittance,and lower refractive index,etc. Possible mechanisms responsible for the better uniformity of the EFMS TiO_2 coatings were also tentatively discussed. We suggest that EFMS film deposition technique be of much technological interest in growth of high quality,large area TiO_2 coatings on industrial scale.