国内溅射靶材行业视角下镍钒溅射靶材的制备及应用探讨

Manufacture and application of Ni-V sputtering target materials from a perspective of sputtering target industry

镍钒溅射靶材是在制备镍钒和金的过程中,在镍熔体中加入钒,使制备出的合金更有利于磁控溅射,结合了镍溅射靶材和钒溅射靶材的优点。随着社会的进步和半导体产业的发展,电子及信息、集成电路、显示器等产业对靶材的需求量越来越大,镍钒溅射靶材需求量也会增多。本文重点介绍了镍钒溅射靶材的应用,对化学成分、纯度、杂质、气孔、晶粒度等的要求,制备工艺等。

Ni-V alloy combined the advantages of nickel and vanadium sputtering target sputtering target.It is adding vanadium in nickel melt. With the social progress and the development of the semiconductor industry, the demand for electronic and information industry, integrated circuit,display of the target is more and more big, the nickel vanadium sputtering target demand will increase.This paper describes the Application of nickel vanadium sputtering,chemical composition,purity, impurity,porosity,grain size and other requirements, the preparation process.