不同湿度条件下N、Si共掺杂DLC膜的摩擦学性能研究

Tribological Properties of N and Si Co-doped DLC Films under Different Humidity Conditions

采用射频化学气相法沉积了氮、硅共掺杂类金刚石碳膜(N-Si-DLC).用X射线光电子能谱仪、拉曼光谱仪、表面形貌仪及扫描电子显微镜等对薄膜结构进行了表征,用球-盘往复摩擦试验机考察了不同湿度(RH为15%,45%和75%)空气中薄膜与316L不锈钢球配副的摩擦学性能.结果表明:与Si-DLC相比,N-Si-DLC膜内sp^2C成分含量较高,N主要以C=N、C≡N、Si-N键形式存在于膜内;膜的内应力低,硬度和杨氏模量较低;含N量少的N-Si-DLC膜显示出更低的摩擦与磨损,其摩擦学性能对湿度的变化表现出较低的敏感性.

Nitrogen and Silicon co-incorporated DLC（N-Si-DLC） films were deposited by RF-CVD method. X-ray photoelectron spectrometer, Raman, surface profilometer and scanning electron microscope were used to characterize the structure and composition of the films. The humidity effect on the tribological properties of the films sliding against an 316 L stainless steel ball was investigated by a ball-on-disk type reciprocating tribometer in humid air（relative humidity of 15%, 45% and 75%）. The results show that the N-Si-DLC films possessed higher sp^2C content and lower internal stress. The N species was attributed to C=N, C≡N, and Si-N. N-Si-DLC films with a small amount of N exhibited lower friction and wear compared to Si-DLC film. Also, these films showed low frictional sensitivity to the environmental humidity.