基于DSP控制的金属离子源脉冲弧电源的研制

Development of metal ion source pulsed-arc power supply based on DSP control

离子源是离子注入设备的重要组成部分,其控制方式,工作频率以及产生离子的种类、电流强度、离子束密度等对离子注入设备的运行效率和稳定性有着重大影响。本文主要论述了一套应用于MEVVA型金属离子源的脉冲弧电源的设计与优化。该电源由触发电源和电弧电源组成,其中触发电源输出峰值电压高达25KV,脉宽为20us;电弧电源输出峰值电压为90V,输出脉宽在200us^3ms范围内可调。该电源采用DSP-28335芯片作为控制系统,输出PWM信号准确控制IGBT的开通关断,从而控制输出脉冲的电压,频率和脉宽;实时监控过压过流信号,保护电源系统安全可靠运行。实验结果表明:此电源各项指标运行正常,电磁干扰小,具有良好的应用价值。

Ion source is an important part for ion implantation equipment, because the control mode, working frequency, and the types of ion produced, current intensity and density of the ion beam have great influence on the efficiency and stability of the ion implantation equipment. In this letter, we mainly discussed the design and optimization of a kind of power supply used for MEVVA metal ion source. The power supply is composed of trigger power and arc power. Among that, the output peak-voltage of trigger power is up to 25 KV, pulse width is 20 us and the output peak-voltage of arc power is 90 V, output pulse width changes between 200us-3ms continuously adjustable. The power supply uses the DSP-28335 chip as the control system, and the on-off of the IGBT was controlled by the output PWM signal accurately. Consequently, the voltage, frequency and pulse width of the output pulse were controlled respectively. The over-voltage and over-current signal are monitored at real time to protect the safe and reliable operation of power system. The results show that this power has good advantages of operation indexes, low electromagnetic interference, and good application values.