沉积温度对类金刚石薄膜性能的影响

Effect of deposition temperature on diamond-like carbon coatings performance

液相法制备工艺简单、成本低等,已成为制备类金刚石薄膜的热点方法,但适合工业化生产的制备工艺参数尚不明确。以Si单晶为基底,通过液相沉积法在Si表面制备类金刚石薄膜,研究了沉积温度与其摩擦学性能之间的关系。结果表明:在40℃条件下制备的类金刚石薄膜表面光滑平整、硬度最高。此时类金刚石薄膜的干摩擦系数最小,耐磨性最强,具有良好的摩擦学性能。

The liquid-phase method for diamond like carbon film with the ~eatures ot 1o,,- pie process has caused wide public concern. However, suitable process parameters for industrial production are unclear. In the present paper, a taonocrystal silicon was taken as a substrate, a diamond like carbon film was prepared on the Si surface through liquid-phase method, and relationship between deposition temperature and tribological performance was investigated. The results showed that, the diamond like carbon film prepared at 40 ~C possesses smoother and denser surface, higher hardness, minimum dry friction coefficient, well abra- sion resistance and tribological performance.