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铝纳米颗粒表面等离子体共振峰可控性研究 被引量:10

Controllability Study of Surface Plasmon Resonance Spectra of Aluminium Nanoparticles
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摘要 在石英基底上制备了铝(Al)薄膜,同时加热烘烤制备了Al纳米颗粒,研究了不同厚度的Al纳米颗粒的吸收特性。结果表明,随着烘烤温度的上升,Al薄膜的粗糙度越来越大;当温度达到300℃时,Al薄膜完全转化成Al纳米颗粒。在300℃的烘烤温度下,当膜厚从5nm增加到25nm时,薄膜的共振吸收峰红移40nm。这种制备Al纳米颗粒的工艺简单、省时、成本低、效率高。 Aluminium (A1) thin films are prepared on the quartz substrate, and meanwhile A1 nanoparticles are obtained by baking the A1 thin films. The absorption property of A1 nanoparticles with different thicknesses are studied. The results show that the roughness of A1 thin films increases with the increase of baking temperature. When the baking temperature reaches 300 ℃, the A1 thin films are completely transformed into AI nanoparticles. When the film thickness varies from 5 nm to 25 nm, the redshift of the thin film resonance absorption peak is 40 nm at the baking temperature of 300 ℃. This fabrication process of Al nanoparticles is simple, time-saving, low-cost, and high-efficiency.
出处 《光学学报》 EI CAS CSCD 北大核心 2017年第9期357-362,共6页 Acta Optica Sinica
基金 国家重点研发计划(2016YFB1102303)
关键词 薄膜 铝纳米颗粒 烘烤温度 表面等离子体共振 thin films Al nanoparticles baking temperature surface plasmon resonance
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  • 1占美琼,黄建兵,尚淑珍,贺洪波,邵建达.真空退火对355nmAl_2O_3/MgF_2高反射薄膜性能的影响[J].强激光与粒子束,2004,16(11):1389-1392. 被引量:11
  • 2申雁鸣,贺洪波,邵淑英,范正修,邵建达.沉积温度对HfO_2薄膜残余应力的影响[J].强激光与粒子束,2005,17(12):1812-1816. 被引量:10
  • 3郭兴家,李晓舟,徐淑坤,康平利.人体血清中胆红素荧光光谱初步分析[J].发光学报,2007,28(4):573-578. 被引量:3
  • 4俞世钢.液体折射率测定方法分析[J].光学仪器,2007,29(4):1-6. 被引量:10
  • 5Pulker H K. Characterization of optical thin films. Appl.Opt. , 1979, 18(12):1969-1977.
  • 6Ritala M, Leskela M. Zirconium dioxide thin films deposited by ALE using zirconium tetrachloride as precursor. Appl. Surf. Sci. , 1994, 75(3):333-340.
  • 7Levichkova M, Mankov V, Starbov N et al.. Structure and properties of nanosized electron beam deposited zirconia thin films. Surface and Coatings Technology,2001, 141(1) :70-77.
  • 8Koch T, Ziemann P. Effects of ion-beam-assisted deposition on the growth of zirconia films. Thin Solid Films, 1997, 303(1-2):122-127.
  • 9Moulzolf S C, Yu Y, Frankel D J et al.. Properties of ZrO2 films on sapphire prepare by electron cyclotron resonance oxygen-plasma-assisted deposition. J. Vac.Sci. Technol., 1997, A15(3):1211-1214.
  • 10Boulle A, Pradier L, Masson Oet al.. Microstructural analysis in epitaxial zirconia layers. Appl. Surf. Sci. ,2002, 188(1-2) :80-84.

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