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基体偏压对ZrN涂层微观结构及力学性能的影响 被引量:2

Influence of Substrate Bias Voltage on Microstructures and Mechanical Properties of ZrN Coatings
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摘要 利用多弧离子镀技术通过改变基体偏压(-100,-150,-200 V)在SKD11模具钢基体上制备了一系列ZrN涂层。采用X射线衍射、扫描电镜、纳米压痕仪、划痕仪、摩擦磨损试验机和台阶仪等分析技术对涂层的结构、表面形貌、硬度、弹性模量、断裂韧性、结合力、摩擦磨损性能等进行表征,重点研究基体偏压对涂层微观结构和力学性能的影响。结果表明,在不同偏压条件下制备的涂层始终由ZrN相构成;随着基体偏压的升高,ZrN涂层生长的择优取向发生了改变,生长择优取向从低偏压下(-100 V)的(311)向(111)(-200 V)转变;硬度和结合力呈现先增后减的趋势,并在偏压为-150 V时达到最大值,分别为29.14 GPa和58 N;摩擦系数及磨损量均在偏压为-150 V时最低。 The ZrN coatings were deposited by multi-arc ion plating on substrate of SKD11 die steel. The influence of the substrate bias voltage on the microstructures and mechanical properties of the ZrN coatings were investigated by means of scanning electron microscopy,X-ray diffraction,and conventional mechanical tools. The results show that the substrate bias voltage significantly affected the microstructures and tribological behavior of the ZrN coatings. To be specific,as the bias voltage increased,the preferential growth orientation of the ZrN-phased coatings shifted from( 311) at-100 V to( 111) at-200 V; the hardness and interfacial adhesion changed in an increase-decrease mode,reaching their peaks of 29. 14 GPa and 58 N at-150 V,respectively. Moreover,the friction coefficient and wear rate of the coatings,grownat-150 V,were found to be the lowest.
作者 毛绍宝 张林 张世宏 Mao Shaobao Zhang Lin Zhang Shihong(Anhui University of Technology, School of Material Science and Engineering, Ma' anshan 243000, China Anhui University of Technology ,Research Center of Modern Surface and Interface Engineering ,Ma' anshan 243000, China)
出处 《真空科学与技术学报》 CSCD 北大核心 2017年第9期916-922,共7页 Chinese Journal of Vacuum Science and Technology
基金 国家自然科学基金项目(51305002 51275095 51522502) 安徽省自然科学基金项目(1408085QE92)
关键词 ZRN涂层 多弧离子镀 偏压 微观结构 力学性能 ZrN coatings, Multi-arc ion plating, Bias voltage, Microstructure, Mechanical properties
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