摘要
提高磁控溅射薄膜沉积过程总体沉积粒子中的荷电粒子比例,可以使薄膜的沉积过程更具有电磁场作用下的引导性,这将直接导致所得沉积薄膜的组份、结构、表面形貌和晶粒度发生明显的变化。本文通过空心阴极磁控溅射技术,对不同沉积工艺位置条件下所得到的两种氮化钛膜层进行了测试分析和讨论。
Increasing percent of charged deposition particles during magnetron sputtering processes, will get more possibility to control some changes of microstructure, phases and thus resultant physical properties of deposited film by electromagnetic field guiding and aligning effect for deposition flux. In this paper, samples, obtained with different technology positions under tube type hollow-cathode magnetron sputtering process, are analyzed by AFM and XRD with the results discussed.
出处
《真空》
CAS
2017年第5期27-30,共4页
Vacuum
关键词
荷电沉积粒子
相变与晶粒度
反应气体活化
charged deposition particle
phase and grain size
activated reactive gas
