摘要
用射频磁控溅射制备Zn_(1-x)Mg_xO薄膜,通过对不同溅射功率制备的薄膜结构和薄膜的室温透射谱和光致发光光谱的分析,得到溅射功率对薄膜结构和形貌的和光学性能的影响。
The Zn1-xMgxO films were prepared by RF magnetron sputtering under different sputtering power. The influence of sputtering power on transmission and Photoluminescence Spectroscopy of Zn1 -xMgxO films was studied. The Optimization parameters of Zn1-xMgxO films were obtained.
出处
《真空》
CAS
2017年第5期31-34,共4页
Vacuum
关键词
射频磁控溅射
Zn1-xMgxO薄膜
透射谱
光致发光谱
RF magnetron sputtering
Zn1-xMgxO films
transmittance spectra
Photoluminescence Spectroscopy
