防蓝光纳米薄膜的磁控溅射制备技术及性能研究

Study on preparation technology and properties of anti blue-light nano films by magnetron sputtering

以稀土材料钬靶,采用中频反应磁控溅射法设计并制备防蓝光多层纳米薄膜,并研究其光学、力学及耐候性等性能。研究表明:膜层对整个蓝光波段反射率达到40%左右,实现蓝光部分阻隔;600~780nm可见光波段透过率高达98%以上,反射率低于1%以下;表面铅笔硬度达到8H,3500次橡皮摩擦无变化;膜层耐候性能优良。

Using rare earth materials as the holmium target, the anti-blue light thin films were fabricated by intermediate frequency reactive magnetron sputtering. The optical, mechanical and weathering properties of the films were studied. The results show that the reflectivity of the film to the blue band is about 40%, achieving partial barrier of blue light. Transmittance of 600~780 nm visible light is up to 98%, and the reflectivity is below 1%.The pencil hardness of surface reached 9H, and didn＇t change after 3500 times of rubber friction . The film has excellent weathering resistance.