溅射工艺参数对MgF_2薄膜光学性质的影响

EFFECT OF SPUTTERING PROCESS PARAMETERS ON OPTICAL PROPERTIES OF MgF_2 THIN FILMS

采用射频磁控溅射工艺,在紫外熔融石英衬底上制备了MgF_2薄膜。通过改变溅射功率和氩气流量,研究了主要溅射工艺参数对薄膜结构和光学性质的影响规律。试验结果表明,选择合适的溅射功率和氩气流量可以提高MgF_2薄膜的光学性质,有利于MgF_2薄膜在紫外波段的应用。

MgF2 films were deposited on fused silica substrates by radio frequency magnetron sputtering. By changing the sputtering power and Ar gas flow rate,the influence of the main sputtering parameters on the structure and optical properties of the films was investigated. The experimental results show that the appropriate sputtering power and Ar gas flow can improve the optical properties of MgF2 thin films,which is beneficial to the application of MgF2 films in the ultraviolet band.