水热法制备高折射率氧化铁薄膜的研究

Preparation of High Refractive Index Iron Oxide Thin Films by Hydrothermal Method

以FeCl_3·6H_2O为原料,采用水热法在玻璃基质上制备高折射率的氧化铁纳米薄膜。研究了反应温度、反应时间、pH值、填充度对所制备纳米氧化铁薄膜折射率的影响。采用自动椭圆偏振仪测试手段对氧化铁纳米膜进行了折射率和膜厚的表征分析。结果表明,水热法制备的薄膜最佳的水热工艺条件是在pH=11、填充度为70%、水热温度160℃、加热4h制备的薄膜厚度一般达130nm左右,折射率可高达2.490,膜表面均匀,平整度较好。

Nanometer ferric oxide films were prepared from six hydrated ferric chloride by hydrothermal method. The effects of hydrothermal temperature, reaction time, compactedness and pH on Three iron oxide films were researched, and the ellipsometer was used to characterize the thickness of nanometer Three iron oxide films and high refractive index. The results show that the optimum hydrothermal technological condition is temperature of 160 ℃, hydrothermal time of 4 h, pH of 11 and compactedness of 70%. Under the optimum condition, the thickness of the films with well--developed crystalline is 130 nm, the refractive index can up to 2.490, the surface of films is quite flat and well--distributed.