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热处理对Sb∶SnO_2透明导电薄膜光电性能的影响 被引量:4

Effect of Heat Treatment on the Optical and Electrical Properties of Sb∶SnO_2 Transparent Conduction Films
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摘要 由烧结法制备了5Sb_2O_5·95SnO_2(mol%)陶瓷靶材,以所制靶材利用射频磁控溅射法在石英玻璃基片上制备得到高质量的Sb∶Sn O2(ATO)透明导电薄膜,研究了热处理温度对ATO薄膜的结构和光学与电学性能的影响。结果表明:热处理对ATO薄膜的相结构,结晶质量及性能均有一定的影响。随着温度升高,所制薄膜的晶粒尺寸逐渐长大,方块电阻逐步减小,最小值为9.3Ω/;红外反射率先增大后减小,并在热处理温度为600℃时达到极大值,为89%。薄膜可见光透过率均在80%以上,温度为600℃时最高达到91.3%。 The high quality Sb∶ SnO2 transparent conduction films were deposited on quartz glass by radio frequency magnetron sputtering using the 5Sb2O5·95SnO2( mol%) ceramic target. The effects of heat treatment temperature on the structure,optical and electrical properties of ATO films were studied. The results show that all the phase structure,crystallinity and properties of ATO films are affected by heat treatment. The grain size of films increases with the increase of the heat treatment temperature,while the sheet resistance decreases until to its ' minimum of 9. 3 Ω/□. The infrared reflectivity firstly increases and then decreases with increasing temperature and shows its' maximum( about 89%) at 600 ℃. The transmittances of films are more than 80% in the visible region and the best sample treated at 600 ℃ is up to 91. 3%.
出处 《硅酸盐通报》 CAS CSCD 北大核心 2017年第9期2951-2957,共7页 Bulletin of the Chinese Ceramic Society
基金 湖北省技术创新重大项目(2013AAA005) 湖北省自然科学基金面上项目(2014CFB563)
关键词 Sb∶SnO2 磁控溅射 红外反射 热处理 Sb- Sn02 magnetron sputtering infrared reflection heat treatment
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