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Improvement in Cr Nanoparticle Content in Ni-Cr Film by Co-deposition with Combined Surfactant HPB and CTAB

Improvement in Cr Nanoparticle Content in Ni-Cr Film by Co-deposition with Combined Surfactant HPB and CTAB
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摘要 The effects of single surfactant hexadecylpyridinium bromide(HPB) and cetyltrimethylammonium bromide(CTAB) and the combination of HPB and CTAB on the Cr nanoparticle content in the Ni-Cr film prepared by codeposition were investigated. Single HPB/CTAB addition inhibited the oxidation and amorphous transformation of the Cr nanoparticles in the plating bath and effectively stabilized the Cr nanoparticles content at approximately 10 mass% as a function of time. Moreover, the combination of HPB and CTAB formed a cylindrical micelle structure on the Cr nanoparticle surface, which prompted the formation of a layer of NiCr2O4. As a result, the Cr nanoparticle content increased sharply to 20 mass%. The effects of single surfactant hexadecylpyridinium bromide(HPB) and cetyltrimethylammonium bromide(CTAB) and the combination of HPB and CTAB on the Cr nanoparticle content in the Ni-Cr film prepared by codeposition were investigated. Single HPB/CTAB addition inhibited the oxidation and amorphous transformation of the Cr nanoparticles in the plating bath and effectively stabilized the Cr nanoparticles content at approximately 10 mass% as a function of time. Moreover, the combination of HPB and CTAB formed a cylindrical micelle structure on the Cr nanoparticle surface, which prompted the formation of a layer of NiCr2O4. As a result, the Cr nanoparticle content increased sharply to 20 mass%.
出处 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2017年第10期999-1007,共9页 金属学报(英文版)
关键词 CO-DEPOSITION Ni-Cr film Cr nanoparticle content HPB CTAB Co-deposition Ni-Cr film Cr nanoparticle content HPB CTAB
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