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Experimental and simulation investigation of electrical and plasma parameters in a low pressure inductively coupled argon plasma 被引量:1

Experimental and simulation investigation of electrical and plasma parameters in a low pressure inductively coupled argon plasma
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摘要 The electrical and plasma parameters of a low pressure inductively coupled argon plasma are investigated over a wide range of parameters(RF power, flow rate and pressure) by diverse characterizations. The external antenna voltage and current increase with the augment of RF power, whereas decline with the enhancement of gas pressure and flow rate conversely.Compared with gas flow rate and pressure, the power transfer efficiency is significantly improved by RF power, and achieved its maximum value of 0.85 after RF power injected excess125 W. Optical emission spectroscopy(OES) provides the local mean values of electron excited temperature and electron density in inductively coupled plasma(ICP) post regime, which vary in a range of 0.81 eV to 1.15 eV and 3.7×10^(16)m^(-3)to 8.7×10^(17)m^(-3)respectively. Numerical results of the average magnitudes of electron temperature and electron density in twodimensional distribution exhibit similar variation trend with the experimental results under different operating condition by using COMSOL Multiphysics. By comprehensively understanding the characteristics in a low pressure ICP, optimized operating conditions could be anticipated aiming at different academic and industrial applications. The electrical and plasma parameters of a low pressure inductively coupled argon plasma are investigated over a wide range of parameters(RF power, flow rate and pressure) by diverse characterizations. The external antenna voltage and current increase with the augment of RF power, whereas decline with the enhancement of gas pressure and flow rate conversely.Compared with gas flow rate and pressure, the power transfer efficiency is significantly improved by RF power, and achieved its maximum value of 0.85 after RF power injected excess125 W. Optical emission spectroscopy(OES) provides the local mean values of electron excited temperature and electron density in inductively coupled plasma(ICP) post regime, which vary in a range of 0.81 eV to 1.15 eV and 3.7×10^(16)m^(-3)to 8.7×10^(17)m^(-3)respectively. Numerical results of the average magnitudes of electron temperature and electron density in twodimensional distribution exhibit similar variation trend with the experimental results under different operating condition by using COMSOL Multiphysics. By comprehensively understanding the characteristics in a low pressure ICP, optimized operating conditions could be anticipated aiming at different academic and industrial applications.
作者 杨健 吴昂键 李晓东 刘阳 朱凤森 陈志良 严建华 陈瑞娟 沈望俊 Jian YANG;Angjian WU;Xiaodong LI;Yang LIU;Fengsen ZHU;Zhiliang CHEN;Jianhua YAN;Ruijuan CHEN;Wangjun SHEN(State Key Laboratory of Clean Energy Utilization, Institute for Thermal Power Engineering, Zhejiang University, Hangzhou 310027, People's Republic of China;Institute of Physics and Optoelectronics, Dalian University of Technology, Dalian 116024, People's Republic of China;China United Engineering Corporation, Hangzhou 310052, People's Republic of China)
出处 《Plasma Science and Technology》 SCIE EI CAS CSCD 2017年第11期12-22,共11页 等离子体科学和技术(英文版)
基金 supported by National Natural Science Foundation of China(No.51576174)
关键词 ICP OES simulation electrical properties ICP, OES, simulation, electrical properties
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