摘要
利用磁控溅射法在不同条件下制备了玻璃基TiO_2薄膜样品,分别研究了衬底温度、工作气压、氧氩比等对TiO_2薄膜亲水性的影响,得到最佳工艺参数,并对此参数下薄膜的亲水性、均匀性、晶相等进行了表征。
TiO_2 film has obtained spreading application with its excellent performance. Discusses the hydrophilicity of the TiO_2 films were prepared by magnetron sputtering under different conditions,The influence on the hydrophilicity of TiO_2 thin films which were prepared at different conditions with the magnetron sputtering method were studied respectively under the substrate temperature,working pressure and argon oxygen ratio to obtain the optimum process parameters. Then the hydrophilicity,homogeneity and crystal equality of the films were tested under the process parameters.
出处
《沈阳工程学院学报（自然科学版）》
2017年第3期283-288,共6页
Journal of Shenyang Institute of Engineering:Natural Science
关键词
TIO2薄膜
磁控溅射法
润湿角
亲水性
TiO2 thin films
magnetron sputtering
wetting angle
hydrophilicity
