摘要
利用激光干涉纳米光刻技术,在钴—铬—钼合金表面制备周期性的凹坑结构。研究了激光干涉纳米光刻过程中,影响材料表面结构的工艺参数,实验验证了三光束激光干涉光刻的曝光时间和光强能量密度对钴—铬—钼合金钢表面微纳米结构凹坑形状、直径及结构面积的影响。
Periodic dimple structure was prepared on cobalt chromium molybdenum alloy surface by laser interference lithography. This paper studies on process parameters affecting surface structure of the material in laser interference nanolithography process. The effects of three beam laser interference lithography on dimple shape,diameter and structure area in exposure time and light energy density were verified.
出处
《黑龙江科学》
2017年第20期34-35,共2页
Heilongjiang Science
关键词
激光干涉
改性
钴铬钼合金
表面
Laser interference
Modification
Cobalt chromium molybdenum alloy
Surface