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温度对类富勒烯碳氮薄膜微观结构与摩擦学性能的影响 被引量:2

Influence of Depositing Temperature on Structure and Tribological Properties of Fullerene-like CN_x Thin Films
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摘要 采用直流反应磁控溅射分别在200、250、300和350℃条件下沉积类富勒烯碳氮薄膜,利用X射线光电子能谱(XPS)和扫描电子显微镜(SEM)表征薄膜的微观结构形貌,采用薄膜综合性能测试仪以及通过大气球盘摩擦试验研究薄膜的力学性能及摩擦学性能。结果显示:制备的类富勒烯CN_x薄膜中存在sp^2C-C、sp^2N-C和sp^3C-N化学键;随着沉积温度的升高,薄膜的结构变得更加致密,硬度、弹性模量以及弹性恢复系数逐渐增大,摩擦因数和磨损率降低;沉积温度为350℃制备的薄膜摩擦因数和磨损率最低,表现出优异的耐磨损性能。 CN, thin films were deposited at 200,250,300 and 350 % by DC magnetron sputtering.X-ray diffraction (XRD) and SEM were used to analyze the microstructure and cross-section morphology.The mechanical and tribological behaviors were evaluated by nano-indentation and ball-on disc instruments tester.The results show that the fullerene-like film as prepared is composed of spz C-C, sp2 N-C and sp3 C-N, and with the increasing deposition temperature, the micro- structure of the fullerene-like film become denser, the hardness, modulus and elastic recovery are increased, while the friction coefficient and wear rate are decreased.The film deposited at the temperature of 350℃ has a lower friction coefficient and wear rate, showing excellent wear resistance.
出处 《润滑与密封》 CAS CSCD 北大核心 2017年第11期7-12,共6页 Lubrication Engineering
基金 真空技术与物理国防科技重点实验室基金项目(9140C550105150C55)
关键词 磁控溅射 类富勒烯 硬度 摩擦学性能 magnetron sputtering fullerene-like films hardness tribology performance
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