聚合物氮化碳材料光激发过程研究进展

Recent Progresses on the Photoexcitation Processes of Polymeric Carbon Nitride-Based Materials

近年来,不含金属元素的聚合物氮化碳半导体以其独特的材料组成和电子结构特征吸引了研究人员的广泛兴趣,在诸如光催化、光致发光、光电化学等光激发相关领域具有潜在的应用前景。聚合物氮化碳光激发过程由能带结构、载流子行为、激子效应等因素所主导,对于这一过程的研究在材料性能的优化、应用领域的拓展以及应用机制的理解等方面具有重要意义。围绕这一主题,本文综述了近年来聚合物氮化碳材料光激发过程研究中取得的最新进展,简单介绍了聚合物半导体光激发过程的研究方法,分别讨论了光激发下材料中的载流子行为和激子过程,进而总结了常用改性策略对于材料光激发过程的调控机制,此外还对材料光响应特性功能化的研究进行了概括。

Recently, the metal-free polymeric carbon nitride has drawn tremendous attention by virtue of its unique material composition and electronic structure, holding great promise in optical excitation related applications, such as photocatalysis, photoluminescence, and photoelectrochemistry. The investigation of photoexcitation processes dominated by energy band structure, charge carrier behaviors and excitonic effects in polymeric carbon nitride are of great significance in understanding mechanisms, optimizing performance and expanding application. Focusing on this topic, we review recent advances in research on the photoexcitation processes of polymeric carbon nitride-based materials, by beginning with a brief introduction of the characterization techniques in these works. We then discuss the charge carrier and exciton aspects in the photoexcitation processes. The principles of universal modification strategies on photoexcitation processes are summarized. Also, the applications of the photoexcitation processes in this polymeric semiconductor are highlighted.