摘要
为提高Ni-Ti形状记忆合金的表面质量,以Ti50.8Ni(原子分数,%)为基材进行纳米级电化学抛光加工试验。基于自行研制的电化学抛光加工系统及抛光液,通过正交试验和单因素试验,分析了电流密度、抛光时间、抛光温度、电极间距等因素对电化学抛光的影响程度及影响机理。采用Micro XAM-100白光干涉仪对抛光试样进行检测。结果表明:最佳抛光工艺为电流密度J=1.0 A/cm2、电极间距d=15 mm、抛光时间t=140 s、抛光温度θ=15℃。在最佳工艺参数下抛光质量良好,试件表面粗糙度值显著降低至27.8 nm,表面平整均匀、光亮如镜。
In order to improve the surface quality of Ni-Ti shape memory alloy, Ti50.8Ni (atom fraction, %) was used as the substrate for nano-electroehemieal polishing proeessing test. The influence and mechanism of current density, polishing time, polishing temperature and electrode gap were analyzed by orthogonal test and single factor test, based on the self- developed electrochemical polishing system and the polishing solution. The polished specimens were tested by MicroXAM-100 white-light interferometer. Results showed that the optimum process- ing parameters were as follows: current density J = 1.0 A/cm2, electrode gap d = 15 mm, polishing time t = 140 s and polishing temperature 0 = 15℃. Under the optimum process parameters, the surface was smooth and bright and the roughness value was 27.8 nm.
出处
《材料保护》
CSCD
北大核心
2017年第11期73-77,共5页
Materials Protection
基金
山东省重点研发计划(公益类专项)项目(2017GGX30116)资助
关键词
电化学抛光
NI-TI合金
粗糙度
抛光液
工艺
electrochemical polishing
Ni -Ti alloy
roughness
polishing solution
process