铟基体分离及其杂质元素在ICP-MS中的测定

The Separation of Indium Base and Analysis of Metal Impurity in Indium by ICP MS

采用自制CL-P350萃淋树脂,用3mol/LHCl-1mol/LHBr作流动相,洗脱除Cd(Ⅱ)以外杂质元素,继而用0.5mol/LNH3-NH4Br缓冲液(pH=9)洗脱Cd(Ⅱ),实现基体分离,杂质元素在同一溶液中得以在ICP-MS仪中测定。

The self-made CL P350 was used as extracting-washing resin,the impurity elements except Cd(Ⅱ) were washed out by 3 mol/L HCl 1 mol/L HBr as flow phase,and then Cd(Ⅱ) was washed out by NH3 NH4Br buffer(pH =9) ,the impurity elements were separated from indium base and determind by ICP-MS.