不同衬底对NiO薄膜结构和光透过性能的影响

Structure and transmission properties of NiO films on different substrates

采用溶胶-凝胶旋涂法分别以玻璃和ITO为衬底,制备出具有较高光透过性能的NiO薄膜.进而利用X射线衍射仪(XRD)、扫描电子显微镜(SEM)、薄膜测厚仪和紫外-可见分光光度计(UV-VIS)分别表征了NiO薄膜的晶粒结构、表面形貌、薄膜厚度及光透过性能,并计算了薄膜的光学带隙值.结果表明:不同的衬底对NiO薄膜的结构和光透过性能具有一定的影响;在玻璃衬底上制备的NiO薄膜晶粒尺寸大小均一且沿NiO(200)择优生长,而在ITO衬底上制备的NiO薄膜晶粒尺寸较小且薄膜厚度较薄.两者在可见光范围内的平均透过率均达到80%左右,但在ITO衬底上制备的NiO薄膜在500nm左右有明显的吸收现象.并且在玻璃衬底上制备的NiO薄膜光学带隙值达到3.95eV.

NiO films with high light transmission on the glass substrate and the ITO substrate were successfully synthesized by sol-gel method.The crystal structural,surface morphology,film thickness and optical transmission spectra of samples were measured by XRD,SEM,Spectra Thick Series and UV-VIS,respectively.And their optical band gap values were calculated.The experimental results indicate that the NiO films on the different substrates had different structure and optical transmission.The grain sizes of NiO films synthesized on the glass substrates are uniform with preferred growth of NiO（200）axis.But the grain sizes of NiO films synthesized on the ITO substrate are smaller and the thickness of films is thinner.The average transmittances in the visible range of NiO thin films are both around 80%,but the NiO films on the ITO substrate has an absorption phenomenon at around 500 nm.Meanwhile,the optical band gap width of the sample that is deposited on glass substrates is larger and reaches to 3.95 eV.