耐电子束辐照高分子材料改性研究进展

Research Progress in Modification of Polymeric Materials by Electron Beam Radiation

概述了电子束辐照应用发展和高分子材料的耐辐照改性;重点叙述了本体耐辐照高分子材料及其使用的局限性,综述了具有大电子云结构的引入、受阻酚类抗氧剂、受阻胺类光稳定剂对高分子材料辐照性能影响的研究,以及其他改性填加剂的作用机理与效果。添加受阻酚类抗氧剂、受阻胺类光稳定剂等对高分子材料耐电子束辐照有一定效果,稳定剂复配具有更加良好的耐辐照效应;开发高效的稳定剂以制备耐辐照高分子材料仍然是十分迫切的研究重点。

This paper overviewed the development of electron beam irradiation and its application for radiation-resistant modification of polymeric materials,and its limitation in utilization for bulk irradiation resistant polymer materials was emphasized.This paper also introduced research results in incorporation of large electron cloud,hindered phenolic antioxidants,and effect of hindered amine light stabilizers on irradiation properties of polymeric materials as well as the use and effectiveness of other radiation-resistant modifiers.It was concluded that the addition of hindered phenolic antioxidants and hindered amine light stabilizers could enhance the radiation resistance of polymeric materials to some extent,and combination of different stabilizers could achieve a much better radiation-resistant effect on polymeric materials.In this case,the development of highly efficient stabilizers will be an urgent issue for the preparation of radiation-resistant polymers.