使用磁过滤阴极弧法以CO_2和N_2为反应气体制备Ti(C,N,O)纳米复合薄膜的研究（英文）

Ti(C,N,O) Nanocomposite Films Fabricated by Filtered Cathodic Vacuum Arc Using CO_2 and N_2 as Precursors

使用磁过滤阴极弧法(FCVA)以CO_2和N_2为反应气体在Si(100)和304不锈钢衬底上沉积Ti(C,N,O)纳米复合薄膜,CO_2和N_2流量比为1;1。薄膜的成分、结构和性能分别采用XPS、XRD、Raman、SEM、摩擦磨损试验机和电化学实验站检测得出。当混合气体流量从10 mL/min增加到50 mL/min时,薄膜中的C和N含量有明显增加,而O和Ti含量有小幅下降;当混合气体流量从50mL/min增加到80 mL/min时,薄膜中的C和N含量下降,而Ti含量有小幅上升,O含量急剧上升。薄膜由nc-Ti(C,N,O)纳米晶结构转变为nc-Ti(C,N,O)/a-CN x,a-TiO_2/a-CN x和N-doped a-TiO_2/a-C纳米复合结构。N-doped a-TiO_2/a-C纳米复合结构薄膜具有最低的摩擦系数(0.34),nc-Ti(C,N,O)/a-CN x和N-doped a-TiO_2/a-C纳米复合结构薄膜在Hanks溶液中均表现出良好的抗腐蚀能力。

Ti（C,N,O） films were deposited on Si（100） and 304 stainless steel by Filtered Cathodic Vacuum Arc（FCVA） using CO2 and N2（with ratio of 1：1） as precursors.The effect of gas flow rate on the composition,phase structure and properties of films was investigated by XPS,XRD,Raman,SEM,tribological test and electrochemical workstation.Results show that the contents of C and N increase obviously,while contents of O and Ti decrease slightly as the gas flow rate increases from 10 mL/min to 50 mL/min.The contents of C and N decrease,while content of Ti increases slightly and content of O increases dramatically as the gas flow rates from 50 mL/min to 80 mL/min.The phase structure of Ti（C,N,O） films transformes from nc-Ti（C,N,O） nanocrystal structure to nc-Ti（C,N,O）/a-CNx nanocomposite structure,a-TiO2/a-CNx and N-doped a-TiO2/a-C nanocomposite structure with gas flow rate increasing from 10 mL/min to 80 mL/min.The N-doped a-TiO2/a-C nanocomposite showed the lowest friction coefficient.Both nc-Ti（C,N,O）/a-CNx nanocomposite structure and N-doped a-TiO2/a-C nanocomposite structure show good anticorrosion ability in Hanks balance solution.