摘要
The substrate treatment with seeding promoter can promote the two-dimensional material lateral growth in chemical vapor deposition （CVD） process. Herein, graphene quantum dots （GQDs） as a novel seeding promoter were used to obtain uniform large-area MoS2 monolayer. The obtained monolayer MoS2 films were confirmed by optical microscope, scanning electron microscope, Raman and photoluminescence spectra. Raman mapping revealed that the MoS2 monolayer was largely homogeneous.
The substrate treatment with seeding promoter can promote the two-dimensional material lateral growth in chemical vapor deposition （CVD） process. Herein, graphene quantum dots （GQDs） as a novel seeding promoter were used to obtain uniform large-area MoS2 monolayer. The obtained monolayer MoS2 films were confirmed by optical microscope, scanning electron microscope, Raman and photoluminescence spectra. Raman mapping revealed that the MoS2 monolayer was largely homogeneous.
基金
Project supported by the National Basic Research Program of China(Grant Nos.2016YFA0202300 and 2016YFA0202302)
the National Natural Science Foundation of China(Grant Nos.61527817,61335006,and 61378073)
the Overseas Expertise Introduction Center for Discipline Innovation,111 Center,China
