薄膜工艺制造误差对电路性能的影响

The Influence of Thin Film Process Manufacturing Error on Circuit Performance

薄膜工艺具有加工高精度图形的能力,广泛应用于微波毫米波电路中。在设计薄膜滤波器等无源电路时,为了降低分析、计算难度,常采用理想模型,未考虑工艺制造误差及材料特性等影响,造成了实测值与计算结果有一定偏差。为了提高薄膜电路设计的准确性,对设备、人员相对稳定的薄膜工艺线各主要工序制造误差进行分析,通过大量实测数据,统计出了该工艺线制造误差范围,常规线宽偏差±4.5μm以内,关键线宽可控制在±2.0μm以内,线条厚度误差±20%以内。根据工艺制造能力,构建电路的三维多参数仿真模型,与理想模型进行对照,给出了薄膜工艺制造误差对滤波器电性能的影响,为今后准确设计滤波器等无源电路提供了有力的指导。应用结果表明,多参数模型与实测结果更为接近。

The thin film process has the ability to process high-precision circuit graphics,and been widely used in microwave and millimeter-wave circuit. In order to reduce the difficulty of analysis and calculation in designs of thin film filter and other passive circuit,often the ideal model is used without considering the manufacturing error and material properties,the measured value and the calculation results have a certain deviation. In order to improve the accuracy of the design of the thin film circuit,the manufacturing er-rors of relatively stable process lines are analyzed,through a large number of measured data,statistics of the process line manufacturing errors are obtained,the conventional line width deviation is within ±4. 5 μm,the key line width can be controlled within ± 2 μm,and the line thickness error is within ±20%. According to the manufacturing ability,the 3D multi-parameter simulation model of the circuit is constructed and compared with the ideal model. The influence of the thin film process error on the electrical performance is summa-rized,which provides guidance for the design of passive circuits such as filters. The results show that the multi-parameter model is closer to the measured result.