基于等离子体光谱的反应磁控溅射镀膜控制系统

Control System of Reactive Magnetron Sputtering Coating Based on Plasma Spectrum

为实现精确、稳定、快速的反应溅射镀膜工艺,降低成本,提高品质,设计基于等离子体光谱的反应溅射镀膜控制系统。通过监控反应溅射镀膜过程中等离子体的发射光谱,采用PID算法控制,实时闭环调节反应气体流量。

In order to realize the accurate, stable and fast reaction sputtering process, reduce the cost, and improve the quality, the system can maintain a high sputtering rate for plating compound film by monitoring the plasma emission spectra in the reactive sputtering process, using PID control algorithm, real-time closed-loop regulation of gas flow rate.