摘要
通过计算双光束全息干涉多次曝光产生的光强空间分布模拟干涉图案,理论分析了记录平面旋转精度、入射光束的偏振夹角和光束夹角以及光强阈值等参数对光学晶格的影响。归纳出入射光束偏振态改变时,相干干涉产生光学晶格的变化规律,并得出激光全息技术中入射光参数的最佳组合,对激光全息技术制备理想的亚微米单晶结构有一定的理论价值和指导意义。
The interference patterns were simulated by calculating the intensity spatial distribution, which interfered by multi-step dual-beam holographic lithography method. The influences of rotation precision of template plane, the polarization states of incidence beams and the light intensity threshold were studied in theory. The result of investigation indicated that the relationship between the polarization states of beams and the clarity of the interference patterns provided the optimal solution on holographic lithography method. This improves the fabrication of sub-micrometer periodic structure much more efficiently in both theoretical and experimental. （OCIS 090. 2880 160. 5298 260.3160） .
出处
《人工晶体学报》
EI
CAS
CSCD
北大核心
2018年第1期97-101,107,共6页
Journal of Synthetic Crystals
基金
北方民族大学重点项目(2015KJ21)
关键词
光子晶体
双光束全息干涉
多次曝光
干涉图案
光强阈值
photonic crystal
dual-beam holographic lithography
multi-step
interference pattern
intensity threshold
