卤硅烷体系脱除B、P杂质工艺的现状及发展趋势

The Research Status and Development Tendency in the Technology of Boron and Phosphorus Removal from Halogenosilane System

首先,重点介绍了目前卤硅烷体系脱除B、P杂质工艺的研究进展,概述了国内外相关研究主要的方法、结果与发现;其次,分析了卤硅烷体系脱除B、P杂质工艺研究的现状,归纳出目前国内外各种方法的优劣性及适用性;最后,对我国卤硅烷体系脱除B、P杂质工艺研究进行了展望,提出我国该工艺研究的发展趋势与方向,今后我国应加强吸附法的研究,分子设计并合成具有特定功能的原子或基团的树脂吸附剂,用于卤硅烷体系除B、P杂质,最终形成流程简单、能耗较低、除杂效果稳定的树脂吸附工艺。

First of all, the research progress of removing B and P impurities in halosilane system is introduced, and the main methods, results and findings of the relevant researches at home and abroad are summarized. Secondly, the present status of the research on the process of removing B and P impurities from the halosilane system is analyzed, and the advantages and applicability of various methods at home and abroad are also summarized.. Finally, the research on the removal of B and P impurities in the halosilane system in China is prospected, and the development trend and direction of the technology research in our countryare pointed out.The study on adsorption method should be emphasized in the future,and the resin adsorbent possessed some specific functional atoms or groups should be designed and synthesized from the aspect of molecular and used for the removal of B, P impurities from the halogenosilane system, eventually forming the simple, low energy consumption and effective resin adsorption process.