Si掺杂TiSiN涂层的结构特征及力学性能

Microstructure and Mechanical Properties of Si-doped TiSiN Coating

通过射频磁控溅射在单晶硅(111)和硬质合金衬底上制备Si掺杂的TiSiN纳米复合涂层。采用双靶溅射技术,保持Ti靶功率不变,改变Si靶的功率以获得Si含量不同的TiSiN纳米复合涂层。用X射线衍射仪(XRD)、扫描电子显微镜(SEM)和显微硬度计表征TiSiN涂层的结构、成分、形貌和硬度。研究结果表明,Si靶溅射功率对TiSiN涂层的结构和力学性能影响较大。随着Si靶溅射功率的增加,TiN晶粒特征峰由(111)向(200)转变,在20 W的Si靶溅射功率下(111)面取向最优。涂层厚度随着功率的增大呈现先增大后减小的趋势。Si以非晶相Si_3N_4的形式存在;随着Si含量的增加表面晶粒得到细化,在20 W的Si靶溅射功率下,涂层晶体生长致密光滑,涂层硬度高达2 600 HV。

The TiSiN nanocomposite coatings were deposited by magnetron sputtering on substrates of Si( 111)and cemented carbide. The two-target magnetron co-sputtering machine was used to deposit the TiSiN hard coatings. The silicon content was controlled by the power of the silicon target. The structure,composition,morphology and hardness of the Ti Si N nanocomposite coatings were studied by XRD,SEM,AFM and microhardness tester.The results show that the silicon target power significantly affects the phase-structures and mechanical properties of the coatings. With the increase of the silicon target power,the characteristic peaks of TiN grains are changed from( 111) to( 200),the plane( 111) orientation is optimal at 20 W of Si sputtering power,and thickness of the coating increases first and then decreases with the increase of Si target power. The Si added in the coatings was in the amorphous Si_3N_4 phase,which had a grain refining effect,as the grain size of TiN decreased with the increase of Si content. The crystal growth density,smooth surface of TiSiN coating was deposited at the silicon target power of20 W,and microhardness reached up to 2 600 HV.