NbF_5前驱体化学气相沉积铌涂层的生长动力学

Growth Kinetics of Niobium Coating Prepared by CVD from NbF_5

采用常压化学气相沉积方法在1150℃下成功制备了组织致密的金属铌涂层,沉积速率达到了250μm/h。通过对沉积后沿进气方向涂层厚度分析,确定了不同位置NbF_5、H_2、HF及Ar的摩尔分数,对数据进行拟合获得了与实验结果吻合较好的生长动力学方程。进一步分析动力学方程可知副产物HF对于沉积速率影响较大而Ar几乎没有影响。

Dense niobium coating was prepared by atmospheric pressure chemical vapor deposition （CVD） at 1150 ℃, and the deposition rate reached 250 ktm/h. The post-deposition coating thickness was analyzed along the gas flow direction, and the mole percentage of NbFs, H2, HF and Ar at different positions were determined. Finally we obtained a growth kinetics equation by data fitting, which agrees well with the experimental results. Further analysis of the kinetic equations reveals that the byproduct HF has a great impact on deposition rate while Ar almost has no effect