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MgAl_2O_4绝缘性的第一性原理研究

First-principle Study on the Insulation of MgAl_2O_4
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摘要 基于密度泛函理论的第一性原理研究了存在本征空位和间隙缺陷的MgAl_2O_4体系。缺陷形成能的结果表明,O_(i4)和V_O分别在富氧(O-rich)和缺氧(O-poor)条件下的形成能最低,两者均在体系中引入深能级,无法增强MgAl_2O_4的导电性。电子结构的结果表明,O_(i4)在价带顶和导带底均引入能级,V_O在禁带中引入深能级,分别存在这两种本征缺陷的MgAl_2O_4依然保持良好的绝缘性。 The native vacancy and interstitial defects in MgAl2O4 were studied with the first- principle methods based on density-functional theory. The results demonstrated that the defect formation of oxygen tetrahedral interstitial (O4) and oxygen vacancy (Vo) are the lowest under the O-rich and O-poor condition. Both Oi4 and Vo introduced deep energy levels in band gap, which can not enhance electrical conductivity of MgAl2O4. The results of electronic structure in- dicated that Oi4 introduced energy levels in the valence-band maximum and conduction-band mini- mum and Vo introduced deep energy levels in band gap. MgAl2O4 with Oi4 and Vo is still a good insulation.
作者 李俊锋 罗怡韵 何海英 李庆青 偰正才 LI Junfeng;LUO Yiyun;HE Haiyinga;LI Qingqing;XIE Zhengcai(Key Laboratory of Optoelectronic Devices and Systems of Ministry of Education and Guangdong Province, College of Optoelectronic Engineering, Shenzhen University, Shenzhen Guangdong 518060, CHN;College of New Materials and New Energies, Shenzhen Technology University, Shenzhen Guangdong 518118, CHN;School of Materials Science and Energy Engineering, Foshan University, Foshan Guangdong 528000, CHN)
出处 《光电子技术》 CAS 2017年第4期240-243,284,共5页 Optoelectronic Technology
基金 国家自然科学基金项目(No.10974136) 深圳市重点实验室提升项目(No.JCYJ20130408172903817) 深圳技术大学科研启动项目
关键词 第一性原理 MGAL2O4 缺陷形成能 电子结构 first-principle MgAl2O4 defect formation electronic structure
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