匀胶胶厚均匀性的研究

Study on the Thickness Uniformity of the Rubber Glue

片式薄膜电阻器的生产采用光刻的工艺来实现电阻图形,会大大降低膜层所受到的应力,保证电阻的稳定性和一致性。改进光刻胶的涂覆均匀性是改进光刻工艺一种最节省成本最有效的技术手段。对匀胶工艺中的最关键的两个技术参数转速和时间进行了分析,同时研究了前烘的温度和时间对显影图形的影响。

During the production of chip film resistors, the resistance pattern can not use of photoetching to realize the resistance graphics will greatly reduce the stress of the film, and ensure the stability and consistency of the resistance.In the photolithography process, improving the uniformity of the photoresist is one of the most cost-effective techniques to improve the photolithography process.The most critical two technological parameters,speed and time, were analyzed, and the influence of the temperature and time of pre-drying on developing graphics was studied.