Silicalite-1型分子筛膜的制备及其表征

Sythesis and Characterization of High Quality Silicalite-1 Zeolite Membrane

以气相SiO_2为硅源,四丙基氢氧化铵(TPAOH)为模板剂,用晶种法在Al2O3圆片载体上制备了分子筛膜,使用X射线衍射(XRD)、扫描电镜(SEM)、红外光谱(IR)技术对制备的分子筛膜进行表征,并通过单组分气体渗透实验对制备的Silicalite-1分子筛膜的渗透性能进行了测试。结果表明,制备的分子筛膜为典型的Silicalite-1型分子筛膜,膜表面晶粒连续性致密性良好,无较大晶间孔和缺陷,膜层厚度约8μm。常温常压下,H2、N2在膜内的渗透率分别为4.35×10-6mol/(m2·s·Pa)和1.16×10-6mol/(m2·s·Pa),膜的H2/N2理想分离因数为3.75。

Using the fumed silica as silicon source and tetrapropylammonium hydroxide（ TPAOH） as structure-directing agent,it was synthesized highly silicalite-1 thin films with smooth surface and excellent continuity. The synthesized samples were characterized by means of XRD,SEM and IR. Besides,gas permeation measurements were performed on MFI type zeolite membranes. It was showed that high performance Silicalite-1 zeolite membranes were synthesized by secondary growth method. The surface of the membrane has good continuity and compactness,and there is no larger intergranular pores and defects. The thickness of membrane is about 8 μm.Under normal temperature and pressure,the permeability of H2 and N2 is 4. 35 × 10-6 mol/（ m2·s·Pa） and 1. 16 × 10-6 mol/（ m2·s·Pa）,respectively. The ideal separation factor of H2/N2 is3. 75.