摘要
以单晶硅(111)和载玻片为基体,采用离子束辅助沉积技术沉积AlO_xN_y薄膜,使用XPS、XRD和椭偏仪研究了氮氧比对AlO_xN_y薄膜的成分、相结构和光学常数的影响。结果表明,随着氮氧比减小,薄膜中氮含量减小,氧含量增加;薄膜由非晶态转变为结晶态,结晶相为AlO_xN_y。沉积薄膜的消光系数为零,呈现电介质特性。随着氮氧比减小,沉积薄膜的折射率减小。随着氮氧比的减小,薄膜中的Al-O键增多是导致AlO_xN_y薄膜折射率减小的主要原因。
The effects of nitrogen-oxygen ratio on composition, microstructure and optical properties of AlOxNy films deposited by ion beam assisted deposition（IBAD） were investigated by XPS, XRD and spectroscopic ellipsometry. The results show that with the ratio of nitrogen to oxygen decreasing, the content of nitrogen in the films decreases, whereas, the content of oxygen in the films increases; at the same time, the amorphous phase in the films transfer to Al ON phase. The zero value for extinction coefficient of the films indicates the deposited films are dielectric materials. And the refractive index of films within the whole wavelength range decreases with decreasing the ratio of nitrogen to oxygen. With the ratio of nitrogen to oxygen decreasing, the increase of Al-O bond in the AlOxNy films leads to the decrease of refractive index.
作者
孟建平
杜淼
刘晓鹏
付志强
郝雷
Meng Jianping1, Du Miao1, Liu Xiaopeng 1 Fu Zhiqiang 2 Hao Lei 1(1. General Research Institute for Nonferrous Metals, Beijing 100088, China） （2. China University of Geosciences （Beijing）, Beijing 100083, China)
出处
《稀有金属材料与工程》
SCIE
EI
CAS
CSCD
北大核心
2018年第3期972-975,共4页
Rare Metal Materials and Engineering
基金
国家科技支撑计划(2015BAA02B04)
关键词
AlOxNy薄膜
氮氧比
离子束辅助沉积
折射率
消光系数
AlOxNy films
nitrogen-oxygen ratio
IBAD（ion beam assisted deposition）
refractive index
extinction coefficient
