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Passivation of carbon dimer defects in amorphous SiO_2/4H–SiC(0001) interface:A first-principles study 被引量:2

Passivation of carbon dimer defects in amorphous SiO_2/4H–SiC(0001) interface:A first-principles study
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摘要 An amorphous SiO2/4 H–Si C(0001) interface model with carbon dimer defects is established based on density functional theory of the first-principle plane wave pseudopotential method.The structures of carbon dimer defects after passivation by H2 and NO molecules are established,and the interface states before and after passivation are calculated by the Heyd–Scuseria–Ernzerhof(HSE06) hybrid functional scheme.Calculation results indicate that H2 can be adsorbed on the O2–C = C–O2 defect and the carbon–carbon double bond is converted into a single bond.However,H2 cannot be adsorbed on the O2–(C = C)′ –O2 defect.The NO molecules can be bonded by N and C atoms to transform the carbon–carbon double bonds,thereby passivating the two defects.This study shows that the mechanism for the passivation of Si O2/4 H–SiC(0001) interface carbon dimer defects is to convert the carbon–carbon double bonds into carbon dimers.Moreover,some intermediate structures that can be introduced into the interface state in the band gap should be avoided. An amorphous SiO2/4 H–Si C(0001) interface model with carbon dimer defects is established based on density functional theory of the first-principle plane wave pseudopotential method.The structures of carbon dimer defects after passivation by H2 and NO molecules are established,and the interface states before and after passivation are calculated by the Heyd–Scuseria–Ernzerhof(HSE06) hybrid functional scheme.Calculation results indicate that H2 can be adsorbed on the O2–C = C–O2 defect and the carbon–carbon double bond is converted into a single bond.However,H2 cannot be adsorbed on the O2–(C = C)′ –O2 defect.The NO molecules can be bonded by N and C atoms to transform the carbon–carbon double bonds,thereby passivating the two defects.This study shows that the mechanism for the passivation of Si O2/4 H–SiC(0001) interface carbon dimer defects is to convert the carbon–carbon double bonds into carbon dimers.Moreover,some intermediate structures that can be introduced into the interface state in the band gap should be avoided.
作者 张轶杰 尹志鹏 苏艳 王德君 Yi-Jie Zhang;Zhi-Peng Yin;Yan Su;De-Jun Wang(Liaoning Integrated Circuit Technology Key Laboratory, School of Control Science and Engineering, Faculty of Electronic Information and Electrical Engineering, Dalian University of Technology, Dalian 116024, China;School of Physics, Dalian University of Technology, Dalian 116024, China)
出处 《Chinese Physics B》 SCIE EI CAS CSCD 2018年第4期376-383,共8页 中国物理B(英文版)
基金 Project supported by the National Natural Science Foundation of China(Grant No.61474013)
关键词 4H-SIC interface defect density of states firstprinciple 4H-SiC, interface defect, density of states, firstprinciple
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