摘要
A new improved two-step method in fabricating Tl2Ba2 CaCu2O8（Tl-2212） thin films is presented in this paper. In the first process of dc magnetron sputtering, the thallium content in the precursor film is largely increased by adjusting the ratio of thallium in the sputtering targets. After the second annealing process in the absence of additional thallium pellets or powder source, high-quality Tl-2212 thin films can be obtained. The proper content of thallium in the precursor film provides a relatively stable atmosphere to guarantee the growth of Tl-2212 film. This method avoids the repeated production of the thallium pellets in the post-annealing process, the repeatability and controllability of the experiment are greatly improved. X-ray diffraction（XRD） scans show that all of the sharp peaks of the sample films can be assigned to the（00 l） peaks of Tl-2212 phase. The highest superconducting critical temperature（Tc） of the films is 105 K and the critical current density（Jc） can achieve 1.93 MA/cm2 in zero magnetic field at 77 K for a 600 nm film.
A new improved two-step method in fabricating Tl2Ba2 CaCu2O8（Tl-2212） thin films is presented in this paper. In the first process of dc magnetron sputtering, the thallium content in the precursor film is largely increased by adjusting the ratio of thallium in the sputtering targets. After the second annealing process in the absence of additional thallium pellets or powder source, high-quality Tl-2212 thin films can be obtained. The proper content of thallium in the precursor film provides a relatively stable atmosphere to guarantee the growth of Tl-2212 film. This method avoids the repeated production of the thallium pellets in the post-annealing process, the repeatability and controllability of the experiment are greatly improved. X-ray diffraction（XRD） scans show that all of the sharp peaks of the sample films can be assigned to the（00 l） peaks of Tl-2212 phase. The highest superconducting critical temperature（Tc） of the films is 105 K and the critical current density（Jc） can achieve 1.93 MA/cm2 in zero magnetic field at 77 K for a 600 nm film.
作者
徐腾达
邢建
王荔田
张金利
赵生辉
熊阳
赵新杰
季鲁
张旭
何明
Teng-Da Xu1, Jian Xing1, Li-Tian Wang1, Jin-Li Zhang1, Sheng-Hui Zhao1, Yang Xiong1, Xin-Jie Zhao1,2, Lu Ji1,2, Xu Zhang1, and Ming He1(1 College of Electronic Information and Optical Engineering, Nankai University, Tianjin 300350, China ;2 Key Laboratory of Photoelectronic Thin Film Devices and Technology of Tianjin, Tianjin 300350, Chin)
基金
Project supported by the National Natural Science Foundation of China(Grant No.51002081)
the Fundamental Research Funds for the Central Universities,China
the Research Program of Application Foundation and Advanced Technology of Tianjin,China(Grant No.15JCQNJC01300)
