期刊文献+

磁流变抛光技术的国内外研究现状 被引量:5

下载PDF
导出
摘要 磁流变抛光技术(MRF)是利用磁流变抛光液在磁场中流变性进行抛光的一种超精密加工方法。介绍了利用磁流变抛光技术抛光工件的过程,详细阐述了磁流变抛光技术国内外的研究现状,最后提出了下一步应该重点研究设计磁流变抛光设备和开展相关工艺参数实验。
作者 王新海
出处 《科学技术创新》 2018年第4期62-63,共2页 Scientific and Technological Innovation
  • 相关文献

参考文献4

二级参考文献42

  • 1高宏刚,曹健林,陈星旦.浮法抛光亚纳米级光滑表面[J].光学学报,1995,15(6):824-825. 被引量:13
  • 2张玉民 戚伯云 等.电磁学[M].北京:中国科学技术大学出版社,1997.25.
  • 3[1]Mark R. Jolly, Jonathan W. Bender, and J. David Carlson. Properties and applications of commercial magnetorheological fluids. SPIE 1998,3327: 262 - 275
  • 4[3]William Kordonski, Stephen Jacobs. Model of Magnetorheological Finishing. Journal of Intelligent Material Systems and Structures, v 7, n 2,Mar, 1996.
  • 5[4]Stephen D. Jacobs, Donald Golini, etc. Magnetorheological finishing: a determinginistic process for optical manufacture. SPIE 1995,2576:372- 382
  • 6[5]Irene M. Peterson, Corning Incorporated. Polishing micro - optic components for use in photonic systems. SPIE 2001,4595: 30 -42
  • 7[6]Aric B. Shorey; Stephen D. Jacobs; William I. Kordonski; Roger F.Gans. Experiments and observations regarding the mechanisms of glass removal in Magnetorheological finishing. Applied Optics 2001,40:20 -33
  • 8[7]Harvey Pollicove; Don Golini. Deterministic manufacturing processes for precision optical surfaces. Key Engineering Materials 2003,238 -239:53 -58
  • 9[8]Steven R. Arrasmith, Stephen D. Jacobs, John C. Lambropoulos, Alexander Maltsev, Donald Golini, and William I. Kordonski. The use of magnetorheological finishing (MRF) to relieve residual stress and subsurface damage on lapped semiconductor silicon wafers. SPIE 2001,4451: 286 - 294
  • 10[4]KORDONSKI W,SHOREY A,SEKERES A.New Magnetically Assisted:Material Removal with Mag-netorheological Fluid Jet[J].s PI E,2003,5180:1072114.

共引文献66

同被引文献46

引证文献5

二级引证文献1

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部