ZnO∶W透明导电薄膜的调制生长与表面氢化处理

Modulation Growth and Surface Hydrogenation Treatment of ZnO∶W Transparent Conductive Films

采用射频磁控溅射法,在不同溅射功率下沉积ZnO∶W薄膜层55min,然后通入体积分数为5%的氢气,并保持溅射参数不变,表面氢化处理8min,获得了表面具有绒面结构的ZnO∶W透明导电薄膜。对样品的显微形貌、结构和表面绒度等性能进行了测试与分析,结果表明:在200 W的溅射功率条件下,氢化处理8 min获得的ZnO∶W样品表面绒度达到92.82,同时具备优异的导电性能(电阻率均值3.93×10^(-4)Ω·cm)。这种表面绒面结构有望进一步提高ZnO透明导电电极电池的转换效率。

Under different sputtering powers,the ZnO∶W film layers are deposited for 55 min by the radio frequency magnetron sputtering method,and then are hydrotreated for 8 minutes by maintaining the stability of sputtering parameters and adding hydrogen with a volume fraction of 5%.The ZnO∶W transparent conductive films with surface-textured structures are obtained.The micro-morphology,structure and surface-texturing degree of samples are tested and analyzed.The results indicate that,the surface-texturing degree of the ZnO∶W samples after hydrogenation for 8 min at the sputtering power of 200 W reaches 92.82,meanwhile,their electro-conductivity is superior whose average electrical resistivity is 3.93×10^-3Ω·cm.It is hopeful for this surface textured structure to further improve the conversion efficiency of the ZnO transparent conductive electrode cells.