ZrO_2(ZrB_2)活性扩散障界面演变行为的研究（英文）

Interfacial Evolution Behavior of ZrO_2(ZrB_2) Active Diffusion Barrier

采用电子束物理气相沉积(Electron Beam Physical Vapor Deposition,EB-PVD)技术在镍基单晶合金Rene N5基体上制备出N5/(ZrB_2+ZrO_2)/Ni Cr Al和N5/ZrO2/NiCrAl两组试样。然后,同时对其进行900℃/5 h恒温氧化和1000℃/250 h、1000℃/300 h及1000℃/350 h循环氧化,并采用SEM、EDS分析方法研究了界面演变行为及退化失效行为,结果表明,Zr B2的加入对活性扩散障界面反应的生成速率有一定的延缓,但不影响具有阻扩散功能的Al2O3扩散障层的最终形成;并且,Zr B2的加入提高了活性扩散障结构的服役寿命,改变了活性扩散障结构的失效方式。

Two sample groups, N5/（ZrB2＋ZrO2）/NiCrA1 and N5/ZrOJNiCrAI, were prepared on Ni-based single crystal alloy （Rene N5） substrate by electron beam physical vapor deposition （EB-PVD）. Both sample groups were exposed to isothermal oxidation at 900℃ for 5 h and at 1000 ℃, for 250 h, 300 h or 350 h. The microstructural evolution and deterioration failure behavior was investigated by scanning electron microscopy （SEM） and energy dispersive spectroscopy （EDS）. The results suggest that the introduction of ZrB2 decelerates the interfacial reaction rate of the active diffusion barrier of Al2O3 but does not affect the final formation of the A1203 diffusion barrier with anti-diffusion properties. Moreover, the introduction of ZrB2 prolongs the service life of active diffusion barrier structure and changes its failure mode.