轴向磁场对电弧离子镀TiN/Cu薄膜性能的影响

Effect of Axial Magnetic Field on Property of TiN/Cu Films Deposited by Arc Ion Plating

使用加可调轴向磁场的电弧离子镀设备在不锈钢基体上制备TiN/Cu薄膜,研究了轴向磁场强度对薄膜微观结构、化学成分、力学性能和耐磨性能的影响。结果表明,在不同强度的磁场下TiN/Cu薄膜具有相同的TiN结构,且以沿TiN(111)面的择优取向为主。随着磁场强度的提高(111)面衍射峰的强度逐渐提高、TiN/Cu薄膜表面的粗糙度先降低后提高、薄膜中Cu的含量逐渐提高、硬度和弹性模量也逐渐提高、薄膜的磨损率先降低后提高。当磁场强度为80 Gs时薄膜的硬度达到约为36 GPa的最大值,耐磨性能最高。

TiN/Cu thin films were prepared on stainless steel substrate by arc ion plating with adjustable axial magnetic field. The effect of axial magnetic field intensity on the microstructure, chemical composition, mechanical properties and wear resistance of the films were investigated. Results indicated that all the TiN/Cu thin films deposited by different magnetic field intensity have the same crystallographic structure as TiN with preferential orientation（111）. With the increasing magnetic field intensity, the diffraction peak intensity of（111） crystal plane significantly enhanced; the surface roughness of TiN/Cu film decreased first and then increased; the Cu content of the film increased gradually; the hardness and elastic modulus of the TiN/Cu film also increased and the wear rate first decreased then increased. When the magnetic field strength reached 80 Gs, the resulted film possessed the highest hardness about 36 GPa and the optimal wear resistance.