基于改进TOPSIS法的脉冲电沉积Ni-W-P镀层工艺优化

Process Optimization of Pulse Electrodeposition Ni-W-P Coating Based on Improved TOPSIS

以占空比、脉冲频率、电流密度、镀液温度为优化工艺参数,以镀层表面硬度、结合强度、磨损量、腐蚀速率为综合优化工艺目标,运用改进的TOPSIS法对脉冲电沉积Ni-P-W合金工艺参数进行优化。优化结果为:占空比30%、脉冲频率250Hz、电流密8A/dm2、镀液温度60℃。采用优化工艺参数进行脉冲电沉积Ni-P-W合金与最优试验设计组相比,表面硬度提高了8.14%,结合强度提高了5.32%,磨损量减小了4.26%,腐蚀速率减小了6.25%。

Based on improved TOPSIS,the process parameters of pulse electrodeposition of Ni P W alloy are optimized with duty cycle,pulse frequency,current density and bath temperature as the processing parameters to be optimized,and surface hardness,bond strength,wear amount and corrosion rate of coating as the targets to be optimized.The optimization results are：duty cycle is 30%,pulse frequency 250 Hz,current density 8 A/dm 2,and bath temperature 60 C.Compared with the optimal test design group,the surface hardness of the pulsed electrodeposition Ni P W alloy is improved by 8.14%,the bonding strength is increased by 5.32%,the wear rate is reduced by 4.26%and the corrosion rate is reduced by 6.25%.